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Saturday, 22 August 2015

VLSI Design


Lecture - 1 Introduction on VLSI Design

Lecture - 2 Bipolar Junction Transistor Fabrication

Lecture - 3 MOSFET Fabrication for IC

Lecture - 4 Crystal Structure of Si

Lecture - 5 Crystal Structure contd

Lecture - 6 Defects in Crystal + Crystal growth

Lecture - 7 Crystal growth Contd + Epitaxy I

Lecture - 8 Epitaxy II - Vapour phase Epitaxy

Lecture - 9 Epitaxy III - Doping during Epitaxy

Lecture - 10 Molecular beam Epitaxy

Lecture - 11 Oxidation I - Kinetics of Oxidation

Lecture - 12 Oxidation II Oxidation rate constants

Lecture - 13 Oxidation III - Dopant Redistribution

Lecture - 14 Oxidation IV - Oxide Charges

Lecture - 15 Diffusion I - Theory of Diffusion

Lecture - 16 Diffusion II - Infinite Source

Lecture - 17 Diffusion III - Actual Doping Profiles

Lecture - 18 Diffusion IV Diffusion Systems

Lecture - 19 Ion - Implantation Process

Lecture - 20 Ion - Implantation Process

Lecture - 21 Annealing of Damages

Lecture - 22 Masking during Implantation

Lecture - 23 Lithography - I

Lecture - 24 Lithography - II

Lecture - 25 Wet Chemical Etching

Lecture - 26 Dry Etching

Lecture - 27 Plasma Etching Systems

Lecture - 28 Etching of Si,Sio2,SiN and other materials

Lecture - 29 Plasma Deposition Process

Lecture - 30 Metalization - I

Lecture - 31 Problems in Aluminium Metal contacts

Lecture - 32 IC BJT - From junction isolation to LOCOS

Lecture - 33 Problems in LOCOS + Trench isolation

Lecture - 34 More about BJT Fabrication and Realization

Lecture - 35 Circuits + Transistors in ECL Circuits

Lecture - 36 MOSFET I - Metal gate vs Self-aligned Poly-gate

Lecture - 37 MOSFET II Tailoring of Device Parameters

Lecture - 38 CMOS Technology

Lecture - 39 Latch - up in CMOS

Lecture - 40 BICMOS Technology