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Saturday, 22 August 2015
VLSI Design
Lecture - 1 Introduction on VLSI Design
Lecture - 2 Bipolar Junction Transistor Fabrication
Lecture - 3 MOSFET Fabrication for IC
Lecture - 4 Crystal Structure of Si
Lecture - 5 Crystal Structure contd
Lecture - 6 Defects in Crystal + Crystal growth
Lecture - 7 Crystal growth Contd + Epitaxy I
Lecture - 8 Epitaxy II - Vapour phase Epitaxy
Lecture - 9 Epitaxy III - Doping during Epitaxy
Lecture - 10 Molecular beam Epitaxy
Lecture - 11 Oxidation I - Kinetics of Oxidation
Lecture - 12 Oxidation II Oxidation rate constants
Lecture - 13 Oxidation III - Dopant Redistribution
Lecture - 14 Oxidation IV - Oxide Charges
Lecture - 15 Diffusion I - Theory of Diffusion
Lecture - 16 Diffusion II - Infinite Source
Lecture - 17 Diffusion III - Actual Doping Profiles
Lecture - 18 Diffusion IV Diffusion Systems
Lecture - 19 Ion - Implantation Process
Lecture - 20 Ion - Implantation Process
Lecture - 21 Annealing of Damages
Lecture - 22 Masking during Implantation
Lecture - 23 Lithography - I
Lecture - 24 Lithography - II
Lecture - 25 Wet Chemical Etching
Lecture - 26 Dry Etching
Lecture - 27 Plasma Etching Systems
Lecture - 28 Etching of Si,Sio2,SiN and other materials
Lecture - 29 Plasma Deposition Process
Lecture - 30 Metalization - I
Lecture - 31 Problems in Aluminium Metal contacts
Lecture - 32 IC BJT - From junction isolation to LOCOS
Lecture - 33 Problems in LOCOS + Trench isolation
Lecture - 34 More about BJT Fabrication and Realization
Lecture - 35 Circuits + Transistors in ECL Circuits
Lecture - 36 MOSFET I - Metal gate vs Self-aligned Poly-gate
Lecture - 37 MOSFET II Tailoring of Device Parameters
Lecture - 38 CMOS Technology
Lecture - 39 Latch - up in CMOS
Lecture - 40 BICMOS Technology
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